INTERNATIONAL ISOIASTM STANDARD 51649 Third edition 2015-03-15 Practice for dosimetry in an electron beam facility for radiation processing at energies between 300 keV and 25 Mev Pratique de la dosimetrie dans une installation de traitement par irradiationutilisant un faisceau d'électrons d'energies comprises entre300keVet 25MeV Reference number ISO/ASTM51649:2015(E) @ISO/ASTMInternational2015 INTERNATIONAL ISO/ASTM51649:2015(E) PDF disclaimer This PDF file may contain embedded typefaces. In accordance with Adobe's licensing policy, this file may be printed or viewed but In downloading this file, parties accept therein the responsibilty of not infringing Adobe's licensing policy. Neither theiso Central Secretariat nor ASTM Intemational accepts any liability in this area. Adobe is a trademark of Adobe Systems Incorporated. Details of the software products used to_create this PDF file can be found in the General Info relative to the fle; the PDF-creation parameters were optimized for printing. Every care has been taken to ensure that the file is suitable foruse by Iso memberbodies and ASTM members. In the unlikely event that a problem relating to it is found, please inform the ISO Central Secretariat or ASTM Intemational at the addresses given below. ISO/ASTMInternational2015 All rights reserved. Unless otherwise specified, no part of this publication may be reproduced or utlized in any form or by any means, electronic or mechanical, including photocopying and microfilm, without permission in writing from either ISO at the address below or isO's member body in the country of the requester. In the United States, such requests should be sent to ASTM International. ISO copyright office ASTM International,100 Barr Harbor Drive, PO Box C700, Case postale 56 · CH-1211 Geneva 20 West Conshohocken, PA 19428-2959, USA Tel. +41 22 749 01 11 Tel. +610 832 9634 Fax +41 22 749 09 47 Fax +610 832 9635 E-mail [email protected] E-mail [email protected] Web www.iso.org Web www.astm.org Published in Switzerland ii @ ISO/ASTM Intermational 2015 All rights reserved ISO/ASTM51649:2015(E) Contents Page 1 Scope.... 1 2 Referenceddocuments 3 Terminology. 2 4 Significance and use... 6 5 Radiation source characteristics 6 6 Documentation............... 9 7 Dosimetry system selection and calibration. 9 8 Installation qualification .... 7 9 Operational qualification. 10 Performance qualification. 8 11 Routine process control ... 9 12 Certification. 10 13 Measurement uncertainty.. 10 10 14 Keywords. Annexes 11 Figure 1 Example showing pulse beam current ('pulse), average beam current (lavg), (pulse width (w) and repetition rate (f) for a pulsed accelerator.. 3 Figure 2 Diagram showing beam iength and beam width for a scanned beam using a conveyor system... 3 ........ Figure 3 Example of electron-beam dose distribution along the scan direction, where the beam 4 Figure 4 4 Atypical depth-dose distributionfor an electron beamin a homogeneous material. Figure 5 Typical pulse current waveform from an S-Band linear accelerator....... 5 Figure A2.1 incident 5.0 MeV (monoenergetic) electrons using the Program iTS3 (19, 21), 13 Figure A2.2 Calculated depth-dose distributions in various homogeneous materials for normally incident 5.0 MeV (monoenergetic) electrons using the Program ITS3 (19, 21). 14 Figure A2.3 Calculated depth-dose distributions in polystyrene fornormally incident electrons at monoenergetic energies from 300 to 1000 keV using the Program ITs3 (19, 20) 15 Figure A2.4 Calculateddepth-dose distributions inpolystyrenefornormallyincidentelectronsat monoenergeticenergiesfrom1.0to5.0MeVusingtheprogramITS3(19,20).. 16 Figure A2.5 Calculated depth-dose distributions in polystyrene for normally incident electrons at monoenergetic energies from5.0 to 12.0 MeV using the program ITS3 (19,20) 17 Figure A2.6 Calculated depth-dose distributions in Al and Ta for normally incident electrons at a monoenergeticenergyof25MeVusingtheprogramITs3(19,24). 18 Figure A2.7 Super